Issued Patents 2002
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6486045 | Apparatus and method for forming deposited film | Takashi Otsuka, Tatsuyuki Aoike, Toshiyasu Shirasuna, Hitoshi Murayama, Daisuke Tazawa +1 more | 2002-11-26 |
| 6443191 | Vacuum processing methods | Hitoshi Murayama, Tatsuyuki Aoike, Toshiyasu Shirasuna, Takashi Ohtsuka, Daisuke Tazawa +2 more | 2002-09-03 |
| 6440504 | Vacuum processing apparatus and vacuum processing method | — | 2002-08-27 |
| 6413592 | Apparatus for forming a deposited film by plasma chemical vapor deposition | Ryuji Okamura, Toshiyasu Shirasuna, Kazuhiko Takada, Hitoshi Murayama | 2002-07-02 |
| 6350497 | Plasma processing method | Hitoshi Murayama, Toshiyasu Shirasuna, Ryuji Okamura, Takashi Ohtsuka, Kazuto Hosoi | 2002-02-26 |
| 6347601 | Film forming apparatus | Kazuto Hosoi, Toshiyasu Shirasuna, Kazuhiko Takada, Ryuji Okamura, Hitoshi Murayama | 2002-02-19 |
| 6336423 | Apparatus for forming a deposited film by plasma chemical vapor deposition | Ryuji Okamura, Toshiyasu Shirasuna, Kazuhiko Takada, Hitoshi Murayama | 2002-01-08 |