Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6436302 | Post CU CMP polishing for reduced defects | Juy-Lung Li, Fred C. Redeker, Rajeev Bajaj, Yutao Ma | 2002-08-20 |
| 6436832 | Method to reduce polish initiation time in a polish process | Yutao Ma, Juilung Li, Fred C. Redeker, Rajeev Bajaj | 2002-08-20 |