Issued Patents 2002
Showing 51–73 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6391753 | Process for forming gate conductors | — | 2002-05-21 |
| 6391728 | Method of forming a highly localized halo profile to prevent punch-through | — | 2002-05-21 |
| 6383904 | Fabrication of self-aligned front gate and back gate of a field effect transistor in semiconductor on insulator | — | 2002-05-07 |
| 6380019 | Method of manufacturing a transistor with local insulator structure | Ming-Ren Lin, Shekhar Pramanick | 2002-04-30 |
| 6380590 | SOI chip having multiple threshold voltage MOSFETs by using multiple channel materials and method of fabricating same | — | 2002-04-30 |
| 6380043 | Low temperature process to form elevated drain and source of a field effect transistor having high-K gate dielectric | — | 2002-04-30 |
| 6380038 | Transistor with electrically induced source/drain extensions | — | 2002-04-30 |
| 6376320 | Method for forming field effect transistor with silicides of different thickness and of different materials for the source/drain and the gate | — | 2002-04-23 |
| 6372584 | Method for making raised source/drain regions using laser | — | 2002-04-16 |
| 6372659 | Fabrication of metal oxide structure for a gate dielectric of a field effect transistor | — | 2002-04-16 |
| 6372589 | Method of forming ultra-shallow source/drain extension by impurity diffusion from doped dielectric spacer | — | 2002-04-16 |
| 6372561 | Fabrication of fully depleted field effect transistor formed in SOI technology with a single implantation step | — | 2002-04-16 |
| 6368947 | Process utilizing a cap layer optimized to reduce gate line over-melt | — | 2002-04-09 |
| 6368982 | Pattern reduction by trimming a plurality of layers of different handmask materials | — | 2002-04-09 |
| 6365445 | Field effect transistor formed in SOI technology with semiconductor material having multiple thicknesses | — | 2002-04-02 |
| 6362055 | Method of gate doping by ion implantation | Ming-Ren Lin | 2002-03-26 |
| 6361874 | Dual amorphization process optimized to reduce gate line over-melt | — | 2002-03-26 |
| 6355543 | Laser annealing for forming shallow source/drain extension for MOS transistor | — | 2002-03-12 |
| 6356213 | System and method for prediction-based lossless encoding | Dawei Huang | 2002-03-12 |
| 6348387 | Field effect transistor with electrically induced drain and source extensions | — | 2002-02-19 |
| 6342410 | Fabrication of a field effect transistor with three sided gate structure on semiconductor on insulator | — | 2002-01-29 |
| 6342438 | Method of manufacturing a dual doped CMOS gate | Ming-Ren Lin | 2002-01-29 |
| 6339017 | Hard mask for integrated circuit fabrication | — | 2002-01-15 |