Issued Patents 1997
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5674769 | Process for forming deep trench DRAMs with sub-groundrule gates | Johann Alsmeier, Christine Dehm, Erwin Hammerl | 1997-10-07 |
| 5670805 | Controlled recrystallization of buried strap in a semiconductor memory device | Erwin Hammerl, Jack A. Mandelman, Herbert L. Ho, Junichi Shiozawa | 1997-09-23 |
| 5663107 | Global planarization using self aligned polishing or spacer technique and isotropic etch process | Matthias Peschke | 1997-09-02 |
| 5643836 | Method for producing a semiconductor layer structure having a planarized surface and the use thereof in the manufacture of bipolar transistors and DRAMS | Thomas Meister | 1997-07-01 |
| 5627092 | Deep trench dram process on SOI for low leakage DRAM cell | Johann Alsmeier | 1997-05-06 |