Issued Patents 1997
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5656519 | Method for manufacturing salicide semiconductor device | — | 1997-08-12 |
| 5593923 | Method of fabricating semiconductor device having refractory metal silicide layer on impurity region using damage implant and single step anneal | Tadahiko Horiuchi, Takashi Ishigami, Hiroyuki Nakamura, Hitoshi Wakabayashi, Takemitsu Kunio +1 more | 1997-01-14 |