Issued Patents 1997
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5702986 | Low-stress method of fabricating field-effect transistors having silicon nitride spacers on gate electrode edges | Viju K. Mathews, Nanseng Jeng | 1997-12-30 |
| 5674776 | Semiconductor processing methods of forming field oxidation regions on a semiconductor substrate | Viju K. Mathews, Nanseng Jeng | 1997-10-07 |
| 5668037 | Method of forming a resistor and integrated circuitry having a resistor construction | Kirk D. Prall, Aftab Ahmad, Howard E. Rhodes, Werner Juengling, Pai-Hung Pan +1 more | 1997-09-16 |
| 5665611 | Method of forming a thin film transistor using fluorine passivation | Gurtej S. Sandhu, Shubneesh Batra | 1997-09-09 |
| 5663088 | Method of forming a Ta.sub.2 O.sub.5 dielectric layer with amorphous diffusion barrier layer and method of forming a capacitor having a Ta.sub.2 O.sub.5 dielectric layer and amorphous diffusion barrier layer | Gurtej S. Sandhu | 1997-09-02 |
| 5661064 | Method of forming a capacitor having container members | Thomas A. Figura | 1997-08-26 |
| 5658829 | Semiconductor processing method of forming an electrically conductive contact plug | Viju K. Mathews, Nanseng Jeng | 1997-08-19 |
| 5637523 | Method of forming a capacitor and a capacitor construction | Brent Keeth | 1997-06-10 |
| 5637514 | Method of forming a field effect transistor | Nanseng Jeng, Viju K. Mathews | 1997-06-10 |
| 5629230 | Semiconductor processing method of forming field oxide regions on a semiconductor substrate utilizing a laterally outward projecting foot portion | Nanseng Jeng, David Dickerson | 1997-05-13 |
| 5624865 | High pressure reoxidation anneal of silicon nitride for reduced thermal budget silicon processing | Klaus Schuegraf, Randhir P. S. Thakur | 1997-04-29 |
| 5597756 | Process for fabricating a cup-shaped DRAM capacitor using a multi-layer partly-sacrificial stack | Thomas A. Figura | 1997-01-28 |