Issued Patents 1997
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5691217 | Semiconductor processing method of forming a pair of field effect transistors having different thickness gate dielectric layers | — | 1997-11-25 |
| 5644166 | Sacrificial CVD germanium layer for formation of high aspect ratio submicron VLSI contacts | Sujit Sharan | 1997-07-01 |