Issued Patents 1997
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5667433 | Keyed end effector for CMP pad conditioner | — | 1997-09-16 |
| 5628869 | Plasma enhanced chemical vapor reactor with shaped electrodes | — | 1997-05-13 |
| 5624304 | Techniques for assembling polishing pads for chemi-mechanical polishing of silicon wafers | Nicholas F. Pasch, Mark Franklin | 1997-04-29 |