Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5702872 | Process for resist pattern formation using positive electrodeposition photoresist compositions | Genji Imai, Tsuguo Yamaoka | 1997-12-30 |
| 5650259 | Processes for pattern formation using photosensitive compositions and liquid development | Genji Imai, Tsuguo Yamaoka | 1997-07-22 |
| 5624781 | Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition | Keisuke Naruse, Yukari Takeda, Hideo Kogure | 1997-04-29 |
| 5591562 | Water and acid developable photoresist composition exhibiting improved adhesion | Nobuo Komatsu, Ikuyo Kai, Nami Konishi, Satoru Furusawa | 1997-01-07 |