Issued Patents 1997
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5702872 | Process for resist pattern formation using positive electrodeposition photoresist compositions | Genji Imai, Naozumi Iwasawa | 1997-12-30 |
| 5681685 | Photopolymerizable composition containing squarylium compound | Kenichi Koseki, Ikuo Shimizu, Hiroshi Toyoda, Hirotaka Kinoshita, Shoshiro Matsushita | 1997-10-28 |
| 5650259 | Processes for pattern formation using photosensitive compositions and liquid development | Genji Imai, Naozumi Iwasawa | 1997-07-22 |