Issued Patents 1997
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5643406 | Chemical-mechanical polishing (CMP) method for controlling polishing rate using ionized water, and CMP apparatus | Naoto Miyashita, Hiroyuki Ohashi | 1997-07-01 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5643406 | Chemical-mechanical polishing (CMP) method for controlling polishing rate using ionized water, and CMP apparatus | Naoto Miyashita, Hiroyuki Ohashi | 1997-07-01 |