SM

Seiya Masuda

HL Hoechst Japan Limited: 4 patents #1 of 38Top 3%
Overall (1997): #5,977 of 185,788Top 4%
4
Patents 1997

Issued Patents 1997

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
5691100 Pattern forming material including photoacid and photobase generators for large exposure latitude Takanori Kudo, Yoshiaki Kinoshita, Klaus-Juergen Przybilla, Natsumi Endo, Natsumi Suehiro +1 more 1997-11-25
5663035 Radiation-sensitive mixture comprising a basic iodonium compound Munirathna Padmanaban, Takanori Kudo, Yoshiaki Kinoshita, Natsumi Suehiro, Yuko Nozaki +2 more 1997-09-02
5641594 Colored, photosensitive resin composition Takanori Kudo, Yuko Nozaki, Kazuya Nagao, Yuki Nanjo, Hiroshi Okazaki +3 more 1997-06-24
5595855 Radiation sensitive composition Munirathna Padmanaban, Yoshiaki Kinoshita, Natsumi Suehiro, Takanori Kudo, Yuko Nozaki +2 more 1997-01-21