NS

Natsumi Suehiro

HL Hoechst Japan Limited: 4 patents #1 of 38Top 3%
📍 Kawagoe, JP: #3 of 126 inventorsTop 3%
Overall (1997): #6,598 of 185,788Top 4%
4
Patents 1997

Issued Patents 1997

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
5691100 Pattern forming material including photoacid and photobase generators for large exposure latitude Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Klaus-Juergen Przybilla, Natsumi Endo +1 more 1997-11-25
5663035 Radiation-sensitive mixture comprising a basic iodonium compound Seiya Masuda, Munirathna Padmanaban, Takanori Kudo, Yoshiaki Kinoshita, Yuko Nozaki +2 more 1997-09-02
5641594 Colored, photosensitive resin composition Takanori Kudo, Yuko Nozaki, Kazuya Nagao, Yuki Nanjo, Hiroshi Okazaki +3 more 1997-06-24
5595855 Radiation sensitive composition Munirathna Padmanaban, Yoshiaki Kinoshita, Takanori Kudo, Seiya Masuda, Yuko Nozaki +2 more 1997-01-21