Issued Patents 1997
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5698859 | Method and device for proximity-effect correction | — | 1997-12-16 |
| 5637424 | Fine pattern lithography with positive use of interference | Kenji Nakagawa | 1997-06-10 |
| 5607821 | Optical exposure method | Kenji Nakagawa, Masao Taguchi, Hiroyuki Tanaka, Satoru Asai, Isamu Hanyu | 1997-03-04 |