Issued Patents 1997
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5607602 | High-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gas | Yuh-Jia Su, Kam S. Law, Haruhiro Harry Goto | 1997-03-04 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5607602 | High-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gas | Yuh-Jia Su, Kam S. Law, Haruhiro Harry Goto | 1997-03-04 |