Issued Patents 1997
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5702563 | Reduced chemical-mechanical polishing particulate contamination | Isidore Salugsugan | 1997-12-30 |
| 5662769 | Chemical solutions for removing metal-compound contaminants from wafers after CMP and the method of wafer cleaning | Steven C. Avanzino | 1997-09-02 |