Issued Patents 1994
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5304775 | Method of etching a wafer having high anisotropy with a plasma gas containing halogens and in inert element | Nobuo Fujiwara, Kyusaku Nishioka | 1994-04-19 |
TS
Teruo Shibano
Overall (1994): #61,026 of 165,921Top 40%
1
Patents 1994