Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5304775 | Method of etching a wafer having high anisotropy with a plasma gas containing halogens and in inert element | Kyusaku Nishioka, Teruo Shibano | 1994-04-19 |
| 5292395 | ECR plasma reaction apparatus having uniform magnetic field gradient | — | 1994-03-08 |