Issued Patents 1994
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5348835 | Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent | Masayuki Oba, Naoko Kihara, Shuzi Hayase, Yukihiro Mikogami, Yoshihiko Nakano +3 more | 1994-09-20 |
| 5340684 | Photosensitive composition and resin-encapsulated semiconductor device | Masayuki Oba, Naoko Kihara, Yukihiro Mikogami | 1994-08-23 |
| 5326675 | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | Hirokazu Niki, Naohiko Oyasato, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato +2 more | 1994-07-05 |