Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5348835 | Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent | Masayuki Oba, Rumiko Hayase, Naoko Kihara, Shuzi Hayase, Yukihiro Mikogami +3 more | 1994-09-20 |
| 5326675 | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | Hirokazu Niki, Rumiko Hayase, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato +2 more | 1994-07-05 |