Issued Patents 1994
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5358823 | Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone | Wolfgang Zahn, Fritz Erdmann, Axel Schmitt | 1994-10-25 |
| 5340682 | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.-carbonyl-.alpha.-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound | Georg Pawlowski, Juergen Lingnau, Ralph R. Dammel, Horst Roeschert | 1994-08-23 |
| 5338641 | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.,.alpha.-bis(sulfonyl) diazo methane as an acid forming compound | Georg Pawlowski, Juergen Lingnau, Ralph R. Dammel, Horst Roeschert | 1994-08-16 |
| 5334481 | Positive diazo quinone photoresist compositions containing antihalation compound | — | 1994-08-02 |
| 5326826 | Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation | Horst Roeschert, Georg Pawlowski, Juergen Fuchs, Ralph R. Dammel | 1994-07-05 |
| 5302488 | Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material | Horst Roeschert, Georg Pawlowski, Juergen Fuchs, Ralph R. Dammel | 1994-04-12 |