RD

Ralph R. Dammel

Hoechst Gmbh: 7 patents #9 of 606Top 2%
HC Hoechst Celanese: 2 patents #12 of 174Top 7%
IBM: 1 patents #741 of 3,003Top 25%
📍 Shizuoka, RI: #1 of 1 inventorsTop 100%
Overall (1994): #480 of 165,921Top 1%
9
Patents 1994

Issued Patents 1994

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
5348842 Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride Dinesh N. Khanna, Douglas McKenzie, Chester J. Sobodacha 1994-09-20
5346806 Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture Georg Pawlowski, Horst Roeschert, Walter Spiess, Charlotte Eckes 1994-09-13
5346804 Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture Geog Pawlowski, Horst Roeschert, Walter Spiess, Charlotte Eckes 1994-09-13
5342727 Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition Richard Vicari, Douglas J. Gordon, William D. Hinsberg, Dennis McKean, Carlton G. Willson 1994-08-30
5340682 Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.-carbonyl-.alpha.-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound Georg Pawlowski, Hans-Joachim Merrem, Juergen Lingnau, Horst Roeschert 1994-08-23
5338641 Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.,.alpha.-bis(sulfonyl) diazo methane as an acid forming compound Georg Pawlowski, Hans-Joachim Merrem, Juergen Lingnau, Horst Roeschert 1994-08-16
5326826 Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation Horst Roeschert, Hans-Joachim Merrem, Georg Pawlowski, Juergen Fuchs 1994-07-05
5302488 Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material Horst Roeschert, Hans-Joachim Merrem, Georg Pawlowski, Juergen Fuchs 1994-04-12
5286602 Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture Georg Pawlowski, Horst Roeschert, Walter Spiess 1994-02-15