Issued Patents 1994
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5364716 | Pattern exposing method using phase shift and mask used therefor | Masao Kanazawa, Tamae Haruki, Yasuko Tabata | 1994-11-15 |
| 5338647 | Reflection type photomask and reflection type photolithography method comprising a concavo-convex surface | Kenichi Kawashima | 1994-08-16 |
| 5276551 | Reticle with phase-shifters and a method of fabricating the same | — | 1994-01-04 |