MJ

Ming Jiang

W( Western Digital (Fremont): 52 patents #3 of 473Top 1%
HG HGST: 44 patents #18 of 1,677Top 2%
WT Western Digital Technologies: 15 patents #202 of 3,180Top 7%
HB Hgst Netherlands, B.V.: 3 patents #257 of 972Top 30%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
BU Board Of Regents For Oklahoma State University: 1 patents #74 of 213Top 35%
HB Hitachi Global Technologies Netherlands B.V.: 1 patents #2 of 42Top 5%
📍 San Jose, CA: #173 of 32,062 inventorsTop 1%
🗺 California: #1,572 of 386,348 inventorsTop 1%
Overall (All Time): #9,910 of 4,157,543Top 1%
120
Patents All Time

Issued Patents All Time

Showing 101–120 of 120 patents

Patent #TitleCo-InventorsDate
7477481 Bilayer trailing shield gap for perpendicular head Hung-Chin Guthrie, Aron Pentek, Sue Siyang Zhang, Tsung-Yuan Chen, Yinshi Liu 2009-01-13
7469467 Method of manufacturing a perpendicular write head Yunxiao Gao, Hung-Chin Guthrie, Sue Siyang Zhang 2008-12-30
7441325 Perpendicular head with trailing shield and rhodium gap process Yunxiao Gao, Hung-Chin Guthrie, Sue Siyang Zhang 2008-10-28
7429493 Method for fabricating a magnetic head for perpendicular recording using a CMP lift-off and resistant layer Sue Siyang Zhang, Yi Zheng 2008-09-30
7396768 Copper damascene chemical mechanical polishing (CMP) for thin film head writer fabrication Jian-Huei Feng, Hung-Chin Guthrie, Sue Siyang Zhang 2008-07-08
7374621 System and method for cleaning chemistry and processing during thin film magnetic head wafer fabrication Hung-Chin Guthrie, Nick Lara, John Jaekoyun Yang 2008-05-20
7306638 Chemical mechanical polishing process for 2.45T CoFeNi structures of thin film magnetic heads Hung-Chin Guthrie, Nick Lara 2007-12-11
7287314 One step copper damascene CMP process and slurry Hung-Chin Guthrie, John Jaekoyun Yang 2007-10-30
7279424 Method for fabricating thin film magnetic heads using CMP with polishing stop layer Hung-Chin Guthrie, Hong Bing Zhang 2007-10-09
7264535 Run-to-run control of backside pressure for CMP radial uniformity optimization based on center-to-edge model Hung-Chin Guthrie, Yeak-Chong Wong 2007-09-04
7220167 Gentle chemical mechanical polishing (CMP) liftoff process Jian-Huei Feng, Hung-Chin Guthrie, John Jaekoyun Yang 2007-05-22
7217666 Reactive ion milling/RIE assisted CMP Hung-Chin Guthrie, Jerry Lo, Aron Pentek, Yi Zheng 2007-05-15
7144518 CMP for corrosion-free CoFe elements for magnetic heads Christopher W. Bergevin, Hung-Chin Guthrie, Tom Harris, John Jaekoyun Yang 2006-12-05
7081041 Manufacturing method for forming a write head top pole using chemical mechanical polishing with a DLC stop layer Hung-Chin Guthrie 2006-07-25
7029376 Process of fabricating write pole in magnetic recording head using rhodium CMP stop layer Hung-Chin Guthrie, Jyh-Shuey Lo, Hong Bing Zhang 2006-04-18
6984613 Post chemical mechanical polishing cleaning solution for 2.45T CoFeNi structures of thin film magnetic heads Hung-Chin Guthrie, Nick Lara 2006-01-10
D484518 Refrigerator air filter 2003-12-30
5957753 Magnetic float polishing of magnetic materials Ranga Komanduri 1999-09-28
5931718 Magnetic float polishing processes and materials therefor Ranga Komanduri 1999-08-03
D297859 Ceiling fan support or similar article 1988-09-27