Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9274438 | Method and system for exposing photoresist in a microelectric device | Hai Sun, Xianzhong Zeng, Winnie Yu | 2016-03-01 |
| 9202480 | Double patterning hard mask for damascene perpendicular magnetic recording (PMR) writer | Xiaohai Xiang, Yun-Fei Li, Jinqiu Zhang, Xianzhong Zeng, Hai Sun | 2015-12-01 |
| 9007719 | Systems and methods for using double mask techniques to achieve very small features | Bing K. Yen, Ling Wang, Xianzhong Zeng, Dujiang Wan, Hai Sun | 2015-04-14 |
| 8649123 | Method to eliminate reactive ion etching (RIE) loading effects for damascene perpendicular magnetic recording (PMR) fabrication | Jinqiu Zhang, Hai Sun, Tsung-Yuan Chen | 2014-02-11 |
| 8563146 | Method and system for providing a magnetic recording pole having a dual sidewall angle | Jinqiu Zhang, Ying Hong, Hai Sun, Guanghong Luo, Xiaoyu Yang +2 more | 2013-10-22 |
| 8394280 | Resist pattern protection technique for double patterning application | Dujiang Wan, Hai Sun, Ling Wang, Xianzhong Zeng | 2013-03-12 |
| 8357244 | Method for lifting off photoresist beneath an overlayer | Lijie Zhao, Wei Zhang | 2013-01-22 |
| 8334093 | Method and system for providing a perpendicular magnetic recording head | Jinqiu Zhang, Hai Sun, Tsung-Yuan Chen, Guanxiong Li | 2012-12-18 |
| 8310785 | Perpendicular magnetic recording head | Jinqiu Zhang, Liubo Hong, Yong Shen, Tsung-Yuan Chen, Honglin Zhu | 2012-11-13 |
| 8284517 | Perpendicular magnetic recording head | Hai Sun, Jinqiu Zhang, Donghong Li, Liubo Hong, Yong Shen | 2012-10-09 |
| 8169473 | Method and system for exposing a photoresist in a magnetic device | Winnie Yu, Hai Sun, Xianzhong Zeng | 2012-05-01 |
| 8163185 | Method and apparatus for lifting off photoresist beneath an overlayer | Hai Sun, Liubo Hong, Rowena Schmidt, Lijie Zhao, Winnie Yu | 2012-04-24 |
| 8136225 | Method and system for providing a perpendicular magnetic recording head | Jinqiu Zhang, Liubo Hong, Yong Shen, Tsung-Yuan Chen, Honglin Zhu | 2012-03-20 |
| 8136224 | Method and system for providing a perpendicular magnetic recording head utilizing a mask having an undercut line | Hai Sun, Jinqiu Zhang, Donghong Li, Liubo Hong, Yong Shen | 2012-03-20 |
| 8081403 | Magnetic element having a smaller critical dimension of the free layer | Benjamin Chen, Danning Yang, Wei Zhang, Hugh C. Hiner, Lei Wang +2 more | 2011-12-20 |
| 8072705 | Method and system for providing a magnetic writer using a BARC | Yizhong Wang, Hong Zhang, Hai Sun, Winnie Yu | 2011-12-06 |
| 7910267 | Method and system for providing optical proximity correction for structures such as a PMR nose | Xianzhong Zeng, Hai Sun, Dujiang Wan, Ling Wang | 2011-03-22 |
| 7846643 | Method and system for providing a structure in a microelectronic device using a chromeless alternating phase shift mask | Hai Sun, Winnie Yu, Yizhong Wang, Xianzhong Zeng | 2010-12-07 |
| 7829264 | Method and system for providing a microelectronic device using a plurality of focus distances | Yizhong Wang, Hai Sun, Winnie Yu | 2010-11-09 |
| 7785666 | Methods for fabricating a magnetic recording device | Hai Sun, Liubo Hong, Yizhong Wang, Winnie Yu, Xianzhong Zeng | 2010-08-31 |
| 7736823 | Method and system for providing optical proximity correction for structures such as a PMR nose | Yizhong Wang, Hai Sun, Winnie Yu | 2010-06-15 |
| 7726009 | Method of fabricating a perpendicular recording write head having a gap with two portions | Yinshi Liu, Benjamin Chen, Kyusik Sin | 2010-06-01 |
| 7419891 | Method and system for providing a smaller critical dimension magnetic element utilizing a single layer mask | Benjamin Chen, Danning Yang, Wei Zhang, Hugh C. Hiner, Lei Wang +2 more | 2008-09-02 |
| 7248431 | Method of fabricating a perpendicular recording write head having a gap with two portions | Yinshi Liu, Benjamin Chen, Kyusik Sin | 2007-07-24 |