Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6251795 | Method for depositing high density plasma chemical vapor deposition oxide with improved topography | Chang-Kuei Huang, Steve H. Y. Yang | 2001-06-26 |
| 6207590 | Method for deposition of high stress silicon dioxide using silane based dual frequency PECVD process | — | 2001-03-27 |