Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
WH

Walter Haeckl — 9 Patents

WAWacker Chemie Ag: 6 patents #158 of 1,324Top 15%
SASiltronic Ag: 3 patents #64 of 300Top 25%
Zeilarn, DE: #2 of 6 inventorsTop 35%
Overall (All Time): #535,341 of 4,157,543Top 15%
9 Patents All Time
Walter Haeckl has been granted 9 US patents while listed as an inventor at Wacker Chemie Ag. The first was granted in 2008 and the most recent in July 2018. Walter Haeckl ranks #535,341 of 4,157,543 US inventors in our database (top 12.9%). Patent records list Walter Haeckl in Zeilarn, DE.

Patents per Year

Patents granted per year, 2008 to 2018Bar chart with a peak of 2 patents in 2015.peak 22008: 1 patents20082011: 1 patents20112012: 1 patents20122015: 2 patents20152017: 2 patents20172018: 2 patents2018

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
10031082 Compositional analysis of a gas or gas stream in a chemical reactor and method for preparing chlorosilanes in a fluidized bed reactor Thorsten Albert GOEBEL, Wolfgang Muenzer, Uwe Paetzold, Natalia Sofina 2018-07-24
9988714 Process for producing polysilicon Barbara Mueller, Robert Ring 2018-06-05
9738531 Process for producing polycrystalline silicon Barbara Mueller, Wolfgang Stoiber 2017-08-22
9650255 Reactor and process for endothermic gas phase reaction in a reactor Andreas Hirschmann, Uwe Paetzold 2017-05-16
9089788 Process for purifying chlorosilanes by distillation Uwe Paetzold, Jan Prochaska 2015-07-28
8940264 Process for producing polycrystalline silicon Karl Hesse, Wilhelm Hoebold, Reinhard Wolf 2015-01-27
8231725 Semiconductor wafers of silicon and method for their production Andreas Sattler, Wilfried von Ammon, Martin Weber, Herbert Schmidt 2012-07-31
8043427 Semiconductor wafers of silicon and method for their production Andreas Sattler, Wilfried von Ammon, Martin Weber, Herbert Schmidt 2011-10-25
7387676 Process for producing silicon semiconductor wafers with defined defect properties, and silicon semiconductor wafers having these defect properties Wilfried von Ammon, Andreas Huber, Ulrich Lambert 2008-06-17