Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10186443 | Misalignment/alignment compensation method, semiconductor lithography system, and method of semiconductor patterning | — | 2019-01-22 |
| 9490181 | Misalignment/alignment compensation method, semiconductor lithography system, and method of semiconductor patterning | — | 2016-11-08 |
| 7413848 | Method of removing photoresist and photoresist rework method | Chi-Hung Wei, Hsin-Hsu Lin | 2008-08-19 |
| 6248178 | Method for removing pad nodules | Cheng-Tzung Tsai, Cheng-Chih Kung, Tai-Yuan Li | 2001-06-19 |
| 5932376 | Phase-shifting mask structure | Wei Liu, Chen-Hao Hwang | 1999-08-03 |