| 9358661 |
Polishing pad |
Yoshiyuki Nakai, Tsuyoshi Kimura, Atsushi Kazuno, Kazuyuki Ogawa |
2016-06-07 |
| 9018099 |
Polishing pad |
Kazuyuki Ogawa, Atsushi Kazuno, Tsuyoshi Kimura |
2015-04-28 |
| 8993648 |
Polishing pad |
Yoshiyuki Nakai, Tsuyoshi Kimura, Atsushi Kazuno, Kazuyuki Ogawa |
2015-03-31 |
| 8845852 |
Polishing pad and method of producing semiconductor device |
Masahiko Nakamori, Takatoshi Yamada, Kazuyuki Ogawa, Atsushi Kazuno, Masahiro Watanabe |
2014-09-30 |
| 8779020 |
Polishing pad |
Atsushi Kazuno, Kazuyuki Ogawa, Masahiko Nakamori, Takatoshi Yamada |
2014-07-15 |
| 8530535 |
Polishing pad |
Atsushi Kazuno, Kazuyuki Ogawa, Masahiko Nakamori, Takatoshi Yamada |
2013-09-10 |
| 8318825 |
Polishing pad and method of producing the same |
Masahiko Nakamori, Takatoshi Yamada, Takashi Masui, Shigeru Komai, Koichi Ono +3 more |
2012-11-27 |
| 8309466 |
Polishing pad |
Kazuyuki Ogawa, Yoshiyuki Nakai, Masahiko Nakamori, Takatoshi Yamada |
2012-11-13 |
| 8303372 |
Polishing pad |
Atsushi Kazuno, Yoshiyuki Nakai, Kazuyuki Ogawa, Tsuyoshi Kimura |
2012-11-06 |
| 8304467 |
Polishing pad |
Atsushi Kazuno, Kazuyuki Ogawa, Masahiko Nakamori, Takatoshi Yamada |
2012-11-06 |
| 8148441 |
Polishing pad and manufacturing method thereof |
Masato Doura, Takeshi Fukuda, Kazuyuki Ogawa, Atsushi Kazuno, Hiroshi Seyanagi +2 more |
2012-04-03 |
| 7871309 |
Polishing pad |
Kazuyuki Ogawa, Atsushi Kazuno, Yoshiyuki Nakai, Masahiro Watanabe, Takatoshi Yamada +1 more |
2011-01-18 |
| 7762870 |
Polishing pad and cushion layer for polishing pad |
Koichi Ono, Masahiko Nakamori, Takatoshi Yamada, Shigeru Komai, Masayuki Tsutsumi |
2010-07-27 |
| 7731568 |
Polishing pad and semiconductor device manufacturing method |
Masahiko Nakamori, Takatoshi Yamada, Kazuyuki Ogawa, Atsushi Kazuno, Masahiro Watanabe |
2010-06-08 |
| 7651761 |
Grinding pad and method of producing the same |
Masahiko Nakamori, Takatoshi Yamada, Takashi Masui, Shigeru Komai, Koichi Ono +4 more |
2010-01-26 |
| 7641540 |
Polishing pad and cushion layer for polishing pad |
Koichi Ono, Masahiko Nakamori, Takatoshi Yamada, Shigeru Komai, Masayuki Tsutsumi |
2010-01-05 |
| 7488236 |
Polishing pad and method of producing the same |
Masahiko Nakamori, Takatoshi Yamada, Shigeru Komai, Koichi Ono, Kazuyuki Ogawa +2 more |
2009-02-10 |
| 7470170 |
Polishing pad and method for manufacture of semiconductor device using the same |
Atsushi Kazuno, Kazuyuki Ogawa, Yoshiyuki Nakai, Masahiko Nakamori, Takatoshi Yamada |
2008-12-30 |
| 7329170 |
Method of producing polishing pad |
Koichi Ono, Masahiko Nakamori, Takatoshi Yamada, Shigeru Komai, Masayuki Tsutsumi |
2008-02-12 |
| RE39858 |
Infrared absorption filter |
Shinya Onomichi, Masanori Kobayashi, Yozo Yamada, Seiichiro Yokoyama |
2007-09-25 |
| RE39857 |
Infrared absorption filter |
Shinya Onomichi, Masanori Kobayashi, Yozo Yamada, Seiichiro Yokoyama |
2007-09-25 |
| 7192340 |
Polishing pad, method of producing the same, and cushion layer for polishing pad |
Koichi Ono, Masahiko Nakamori, Takatoshi Yamada, Shigeru Komai, Masayuki Tsutsumi |
2007-03-20 |
| 6629833 |
Transparent conductive film and touch panel |
Toshiyuki Ohya, Yozo Yamada |
2003-10-07 |
| 6542292 |
Infrared absorption filter |
Shinya Onomichi, Seiichiro Yokoyama |
2003-04-01 |
| 6522463 |
Infrared absorption filter |
Shinya Onomichi, Masanori Kobayashi, Yozo Yamada, Seiichiro Yokoyama |
2003-02-18 |