Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11168421 | Elastic network structure with excellent quietness and hardness | Hiroyuki Wakui | 2021-11-09 |
| 9394638 | Polyimide nonwoven fabric and process for production thereof | Satoshi Maeda, Tooru Kitagawa, Hisato Kobayashi, Yasuo Ohta | 2016-07-19 |
| 9023534 | Polyamide imide fiber, non-woven fabric composed of the fiber, process for manufacture of the non-woven fabric, and separator for electronic component | Yasuo Ohta, Hisato Kobayashi, Syoji Oda, Nobuyuki Taniguchi, Daisuke Sakura +1 more | 2015-05-05 |
| 8845852 | Polishing pad and method of producing semiconductor device | Tetsuo Shimomura, Takatoshi Yamada, Kazuyuki Ogawa, Atsushi Kazuno, Masahiro Watanabe | 2014-09-30 |
| 8779020 | Polishing pad | Atsushi Kazuno, Kazuyuki Ogawa, Takatoshi Yamada, Tetsuo Shimomura | 2014-07-15 |
| 8530535 | Polishing pad | Atsushi Kazuno, Kazuyuki Ogawa, Takatoshi Yamada, Tetsuo Shimomura | 2013-09-10 |
| 8318825 | Polishing pad and method of producing the same | Tetsuo Shimomura, Takatoshi Yamada, Takashi Masui, Shigeru Komai, Koichi Ono +3 more | 2012-11-27 |
| 8309466 | Polishing pad | Kazuyuki Ogawa, Tetsuo Shimomura, Yoshiyuki Nakai, Takatoshi Yamada | 2012-11-13 |
| 8304467 | Polishing pad | Atsushi Kazuno, Kazuyuki Ogawa, Takatoshi Yamada, Tetsuo Shimomura | 2012-11-06 |
| 8148441 | Polishing pad and manufacturing method thereof | Masato Doura, Takeshi Fukuda, Kazuyuki Ogawa, Atsushi Kazuno, Hiroshi Seyanagi +2 more | 2012-04-03 |
| 7871309 | Polishing pad | Kazuyuki Ogawa, Tetsuo Shimomura, Atsushi Kazuno, Yoshiyuki Nakai, Masahiro Watanabe +1 more | 2011-01-18 |
| 7762870 | Polishing pad and cushion layer for polishing pad | Koichi Ono, Tetsuo Shimomura, Takatoshi Yamada, Shigeru Komai, Masayuki Tsutsumi | 2010-07-27 |
| 7731568 | Polishing pad and semiconductor device manufacturing method | Tetsuo Shimomura, Takatoshi Yamada, Kazuyuki Ogawa, Atsushi Kazuno, Masahiro Watanabe | 2010-06-08 |
| 7651761 | Grinding pad and method of producing the same | Tetsuo Shimomura, Takatoshi Yamada, Takashi Masui, Shigeru Komai, Koichi Ono +4 more | 2010-01-26 |
| 7641540 | Polishing pad and cushion layer for polishing pad | Koichi Ono, Tetsuo Shimomura, Takatoshi Yamada, Shigeru Komai, Masayuki Tsutsumi | 2010-01-05 |
| 7488236 | Polishing pad and method of producing the same | Tetsuo Shimomura, Takatoshi Yamada, Shigeru Komai, Koichi Ono, Kazuyuki Ogawa +2 more | 2009-02-10 |
| 7470170 | Polishing pad and method for manufacture of semiconductor device using the same | Tetsuo Shimomura, Atsushi Kazuno, Kazuyuki Ogawa, Yoshiyuki Nakai, Takatoshi Yamada | 2008-12-30 |
| 7378454 | Polyurethane composition and polishing pad | Takashi Masui, Takatoshi Yamada, Koichi Ono, Kazuyuki Ogawa, Atsushi Kazuno +1 more | 2008-05-27 |
| 7329170 | Method of producing polishing pad | Koichi Ono, Tetsuo Shimomura, Takatoshi Yamada, Shigeru Komai, Masayuki Tsutsumi | 2008-02-12 |
| 7192340 | Polishing pad, method of producing the same, and cushion layer for polishing pad | Koichi Ono, Tetsuo Shimomura, Takatoshi Yamada, Shigeru Komai, Masayuki Tsutsumi | 2007-03-20 |
| 6245483 | Photosensitive resin composition | Chihiro Oshimo, Tohru Wada | 2001-06-12 |