Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12247299 | Treatment liquid for semiconductor with ruthenium and method of producing the same | Tomoaki Sato, Takafumi SHIMODA, Takayuki NEGISHI | 2025-03-11 |
| 12247298 | Semiconductor wafer treatment liquid and production method thereof | Tomoaki Sato, Takafumi SHIMODA, Takayuki NEGISHI | 2025-03-11 |
| 12195658 | Treatment liquid for semiconductor wafers | Tomoaki Sato, Takafumi SHIMODA, Takayuki NEGISHI | 2025-01-14 |
| 12024663 | Onium salt-containing treatment liquid for semiconductor wafers | Tomoaki Sato, Takafumi SHIMODA, Takayuki NEGISHI | 2024-07-02 |
| 11932590 | Inhibitor for RuO4 gas generation and method for inhibiting RuO4 gas generation | Tomoaki Sato, Takafumi SHIMODA, Takayuki NEGISHI | 2024-03-19 |
| 11674230 | Treatment liquid for semiconductor with ruthenium and method of producing the same | Tomoaki Sato, Takafumi SHIMODA, Takayuki NEGISHI | 2023-06-13 |
| 11572533 | Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer | Takafumi SHIMODA, Takayuki NEGISHI, Seiji Tono | 2023-02-07 |
| 11572331 | Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers | Takafumi SHIMODA, Tomoaki Sato, Takayuki NEGISHI | 2023-02-07 |
| 11390577 | Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers | Takafumi SHIMODA, Tomoaki Sato, Takayuki NEGISHI | 2022-07-19 |
| 11390829 | Treatment liquid for semiconductor wafers, which contains hypochlorite ions | Takafumi SHIMODA, Takayuki NEGISHI, Seiji Tono | 2022-07-19 |