Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10103057 | Use of an inhibitor molecule in chemical vapor deposition to afford deposition of copper on a metal substrate with no deposition on adjacent SIO2 substrate | John R. Abelson, Elham Mohimi, Gregory S. Girolami | 2018-10-16 |
| 8846146 | Smoothing agents to enhance nucleation density in thin film chemical vapor deposition | John R. Abelson, Gregory S. Girolami, Navneet Kumar | 2014-09-30 |