Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6569773 | Method for anisotropic plasma-chemical dry etching of silicon nitride layers using a gas mixture containing fluorine | Rainer Kirchmann | 2003-05-27 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6569773 | Method for anisotropic plasma-chemical dry etching of silicon nitride layers using a gas mixture containing fluorine | Rainer Kirchmann | 2003-05-27 |