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USPTO Patent Rankings Data through Dec 31, 2025
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James E. Rapp — 14 Patents

TETechneglas: 5 patents #1 of 7Top 15%
OWOwens-Illinois: 3 patents #135 of 484Top 30%
Sap Se: 2 patents #1,751 of 6,322Top 30%
Microsoft: 2 patents #17,644 of 40,388Top 45%
Eagan, MN: #83 of 891 inventorsTop 10%
Minnesota: #5,382 of 52,454 inventorsTop 15%
Overall (All Time): #332,869 of 4,157,543Top 9%
14 Patents All Time
James E. Rapp has been granted 14 US patents while listed as an inventor at Techneglas. The first was granted in 1981 and the most recent in January 2024. James E. Rapp ranks #332,869 of 4,157,543 US inventors in our database (top 8.0%). Patent records list James E. Rapp in Eagan, MN, US.

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
11875368 Proactively predicting transaction quantity based on sparse transaction data Pankti Jayesh Kansara, John Seeburger, Sangeetha Krishnamoorthy, Mario Ponce Midence 2024-01-16 $5,473,000
11854022 Proactively predicting transaction dates based on sparse transaction data Ninad Kulkarni, Jing Wang, Pankti Jayesh Kansara, Mario Ponce Midence 2023-12-26 $4,058,000
9310228 Compressed air indicator 2016-04-12
9146836 Linking diagnostic visualizations to application code Daniel Griffing, Alexander Dadiomov, Matthew Jacobs, Ben Nesson, Drake A. Campbell +6 more 2015-09-29 $56,898,000
8490058 Time-based navigation within resource utilization data Daniel Griffing, Alexander Dadiomov, Matthew Jacobs, Hazim Shafi, Ryan A. Nowak +7 more 2013-07-16 $16,054,000
6461948 Method of doping silicon with phosphorus and growing oxide on silicon in the presence of steam Russell B. Rogenski 2002-10-08
5656541 Low temperature P.sub.2 O.sub.5 oxide diffusion source Gary Pickrell 1997-08-12
5629234 High temperature phosphorous oxide diffusion source Gary Pickrell 1997-05-13
5350460 High temperature phosphorus oxide diffusion source Gary Pickrell 1994-09-27
5350461 Low temperature P.sub.2 O.sub.5 oxide diffusion source Gary Pickrell 1994-09-27
4891331 Method for doping silicon wafers using Al.sub.2 O.sub.3 /P.sub.2 O.sub.5 composition 1990-01-02
4800175 Phosphorous planar dopant source for low temperature applications 1989-01-24
4379006 B.sub.2 O.sub.3 Diffusion processes 1983-04-05 $2,721,000
4282282 Barium aluminosilicate glasses, glass-ceramics and dopant 1981-08-04 $1,334,000