SN

Shunichi Nabeya

TK Tanaka Kikinzoku Kogyo K.K.: 9 patents #34 of 436Top 8%
TK Tanaka Kikinzoku K.K.: 1 patents #2 of 21Top 10%
📍 Tsukuba, JP: #332 of 2,818 inventorsTop 15%
Overall (All Time): #454,486 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
10526698 Chemical deposition raw material including heterogeneous polynuclear complex and chemical deposition method using the chemical deposition raw material Ryosuke Harada, Toshiyuki Shigetomi, Kazuharu Suzuki, Akiko Kumakura, Tatsutaka Aoyama +1 more 2020-01-07
10465283 Organoplatinum compound for use in the chemical deposition of platinum compound thin films Ryosuke Harada, Toshiyuki Shigetomi, Kazuharu Suzuki, Akiko Kumakura, Rumi Kobayashi +1 more 2019-11-05
10407450 Heterogeneous polynuclear complex for use in the chemical deposition of composite metal or metal compound thin films Ryosuke Harada, Toshiyuki Shigetomi, Kazuharu Suzuki, Akiko Kumakura, Tatsutaka Aoyama +1 more 2019-09-10
10131987 Raw material for chemical deposition including organoruthenium compound, and chemical deposition method using the raw material for chemical deposition Ryosuke Harada, Toshiyuki Shigetomi, Kazuharu Suzuki, Takayuki Sone, Akiko Kumakura 2018-11-20
10077282 Raw material for chemical deposition composed of organoplatinum compound, and chemical deposition method using the raw material for chemical deposition Ryosuke Harada, Toshiyuki Shigetomi, Kazuharu Suzuki, Akiko Kumakura, Tatsutaka Aoyama +1 more 2018-09-18
9805936 Method for producing nickel thin film on a Si substrate by chemical vapor deposition method, and method for producing Ni silicide thin film on Si substrate Ryosuke Harada, Kazuharu Suzuki, Takayuki Sone, Michihiro Yokoo 2017-10-31
9447495 Chemical vapor deposition raw material containing organic nickel compound, and chemical vapor deposition method using the chemical vapor deposition raw material Kazuharu Suzuki, Masayuki Saito, Ryosuke Harada, Satoshi Miyazaki 2016-09-20
9382616 Chemical vapor deposition raw material comprising organoplatinum compound, and chemical vapor deposition method using the chemical vapor deposition raw material Masayuki Saito, Kazuharu Suzuki, Toshiyuki Shigetomi 2016-07-05
9108997 Method for recycling organic ruthenium compound for chemical vapor deposition Ryosuke Harada, Toshiyuki Shigetomi, Masayuki Saito 2015-08-18
8911827 Chemical vapor deposition method using an organoplatinum compound Kazuharu Suzuki, Masayuki Saito 2014-12-16
8642796 Organoruthenium compound for chemical deposition and chemical deposition process using the organoruthenium compound Masayuki Saito, Kazuharu Suzuki 2014-02-04