Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11149045 | Raw material for vapor deposition including organoplatinum compound and vapor deposition method using the raw material for vapor deposition | Ryosuke Harada, Shigeyuki OOTAKE, Toshiyuki Shigetomi | 2021-10-19 |
| 11084837 | Chemical deposition raw material including iridium complex and chemical deposition method using the chemical deposition raw material | Ryosuke Harada, Toshiyuki Shigetomi | 2021-08-10 |
| 10526698 | Chemical deposition raw material including heterogeneous polynuclear complex and chemical deposition method using the chemical deposition raw material | Ryosuke Harada, Toshiyuki Shigetomi, Shunichi Nabeya, Akiko Kumakura, Tatsutaka Aoyama +1 more | 2020-01-07 |
| 10465283 | Organoplatinum compound for use in the chemical deposition of platinum compound thin films | Ryosuke Harada, Toshiyuki Shigetomi, Shunichi Nabeya, Akiko Kumakura, Rumi Kobayashi +1 more | 2019-11-05 |
| 10407450 | Heterogeneous polynuclear complex for use in the chemical deposition of composite metal or metal compound thin films | Ryosuke Harada, Toshiyuki Shigetomi, Shunichi Nabeya, Akiko Kumakura, Tatsutaka Aoyama +1 more | 2019-09-10 |
| 10131987 | Raw material for chemical deposition including organoruthenium compound, and chemical deposition method using the raw material for chemical deposition | Ryosuke Harada, Toshiyuki Shigetomi, Shunichi Nabeya, Takayuki Sone, Akiko Kumakura | 2018-11-20 |
| 10077282 | Raw material for chemical deposition composed of organoplatinum compound, and chemical deposition method using the raw material for chemical deposition | Ryosuke Harada, Toshiyuki Shigetomi, Shunichi Nabeya, Akiko Kumakura, Tatsutaka Aoyama +1 more | 2018-09-18 |
| 9805936 | Method for producing nickel thin film on a Si substrate by chemical vapor deposition method, and method for producing Ni silicide thin film on Si substrate | Shunichi Nabeya, Ryosuke Harada, Takayuki Sone, Michihiro Yokoo | 2017-10-31 |
| 9447495 | Chemical vapor deposition raw material containing organic nickel compound, and chemical vapor deposition method using the chemical vapor deposition raw material | Masayuki Saito, Ryosuke Harada, Shunichi Nabeya, Satoshi Miyazaki | 2016-09-20 |
| 9382616 | Chemical vapor deposition raw material comprising organoplatinum compound, and chemical vapor deposition method using the chemical vapor deposition raw material | Masayuki Saito, Toshiyuki Shigetomi, Shunichi Nabeya | 2016-07-05 |
| 8920875 | Cyclooctatetraenetricarbonyl ruthenium complex, method of producing the same, and method of producing film using the complex as raw material | Masayuki Saito | 2014-12-30 |
| 8911827 | Chemical vapor deposition method using an organoplatinum compound | Shunichi Nabeya, Masayuki Saito | 2014-12-16 |
| 8642796 | Organoruthenium compound for chemical deposition and chemical deposition process using the organoruthenium compound | Masayuki Saito, Shunichi Nabeya | 2014-02-04 |