Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261036 | Forming low-stress silicon nitride layer through hydrogen treatment | Wei-Che Hsieh, Ching-Yu Huang, Chunyao Wang, Tze-Liang Lee | 2025-03-25 |
| 12051603 | System and method for annealing die and wafer | — | 2024-07-30 |
| 11855213 | FinFET device and method of forming same | Fu-Ting Yen | 2023-12-26 |
| 11830727 | Forming low-stress silicon nitride layer through hydrogen treatment | Wei-Che Hsieh, Ching-Yu Huang, Chunyao Wang, Tze-Liang Lee | 2023-11-28 |
| 11393674 | Forming low-stress silicon nitride layer through hydrogen treatment | Wei-Che Hsieh, Ching-Yu Huang, Chunyao Wang, Tze-Liang Lee | 2022-07-19 |
| 11296225 | FinFET device and method of forming same | Fu-Ting Yen | 2022-04-05 |
| 11011394 | System and method for annealing die and wafer | — | 2021-05-18 |
| 10868131 | Gaseous spacer and methods of forming same | Ching-Yu Huang | 2020-12-15 |
| 10510861 | Gaseous spacer and methods of forming same | Ching-Yu Huang | 2019-12-17 |