Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12327734 | Chemical mechanical polish slurry and method of manufacture | Tung-Kai Chen, Chih-Chieh Chang, Kao-Feng Liao, Hui-Chi Huang, Kei-Wei Chen | 2025-06-10 |
| 12300508 | Chemical mechanical polishing method | Tung-Kai Chen, Ching-Hsiang Tsai, Kao-Feng Liao, Chih-Chieh Chang, Fang-I Chih +4 more | 2025-05-13 |
| 12249542 | Semiconductor device structure with an interconnect structure in a dielectric layer with multiple hydrophobic layers along sidewalls of the dielectric layer, and method for forming the same | Chih-Chieh Chang, Kao-Feng Liao, Hui-Chi Huang, Kei-Wei Chen | 2025-03-11 |
| 12087590 | Self-healing polishing pad | Hui-Chi Huang, Kei-Wei Chen, Yen-Ting Chen | 2024-09-10 |
| 12036636 | Mega-sonic vibration assisted chemical mechanical planarization | Shang-Yu Wang, Ching-Hsiang Tsai, Hui-Chi Huang, Kei-Wei Chen | 2024-07-16 |
| 11964358 | Chemical mechanical polishing apparatus and method | Shang-Yu Wang, Ching-Hsiang Tsai, Kei-Wei Chen, Hui-Chi Huang | 2024-04-23 |
| 11854872 | Semiconductor device structure with interconnect structure and method for forming the same | Chih-Chieh Chang, Kao-Feng Liao, Hui-Chi Huang, Kei-Wei Chen | 2023-12-26 |
| 11854827 | Magnetic slurry for highly efficiency CMP | Yen-Ting Chen, Tung-Kai Chen, Hui-Chi Huang, Kei-Wei Chen | 2023-12-26 |
| 11590627 | Mega-sonic vibration assisted chemical mechanical planarization | Shang-Yu Wang, Ching-Hsiang Tsai, Hui-Chi Huang, Kei-Wei Chen | 2023-02-28 |
| 11551936 | Self-healing polishing pad | Hui-Chi Huang, Kei-Wei Chen, Yen-Ting Chen | 2023-01-10 |
| 11417566 | Semiconductor device structure with interconnect structure and method for forming the same | Chih-Chieh Chang, Kao-Feng Liao, Hui-Chi Huang, Kei-Wei Chen | 2022-08-16 |
| 11373879 | Chemical mechanical polishing method | Tung-Kai Chen, Ching-Hsiang Tsai, Kao-Feng Liao, Chih-Chieh Chang, Fang-I Chih +4 more | 2022-06-28 |
| 11145751 | Semiconductor structure with doped contact plug and method for forming the same | Kuo-Ju Chen, Su-Hao Liu, Liang-Yin Chen, Huicheng Chang, Kei-Wei Chen +6 more | 2021-10-12 |
| 11056352 | Magnetic slurry for highly efficient CMP | Yen-Ting Chen, Tung-Kai Chen, Hui-Chi Huang, Kei-Wei Chen | 2021-07-06 |
| 11043396 | Chemical mechanical polish slurry and method of manufacture | Tung-Kai Chen, Chih-Chieh Chang, Kao-Feng Liao, Hui-Chi Huang, Kei-Wei Chen | 2021-06-22 |
| 10953514 | Chemical mechanical polishing apparatus and method | Shang-Yu Wang, Ching-Hsiang Tsai, Kei-Wei Chen, Hui-Chi Huang | 2021-03-23 |
| 10777423 | Chemical mechanical polishing method | Tung-Kai Chen, Ching-Hsiang Tsai, Kao-Feng Liao, Chih-Chieh Chang, Fang-I Chih +4 more | 2020-09-15 |
| 10741381 | CMP cleaning system and method | Kaw-Wei Kuo, Kuo-Feng Huang, Yi-Wei Chiu, Wei-Chun Chen | 2020-08-11 |