Issued Patents All Time
Showing 26–30 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5981388 | Plasma CVD method for forming a semiconductor device having metal film formed thereby | — | 1999-11-09 |
| 5962084 | Plasma CVD process and semiconductor device having metal film formed by the process | Shingo Kadomura, Atsushi Kawashima | 1999-10-05 |
| 5840628 | Plasma CVD method for depositing tin layer | — | 1998-11-24 |
| 5831335 | Semiconductor device contains refractory metal or metal silicide with less than 1% weight of halogen atom | — | 1998-11-03 |
| 5747384 | Process of forming a refractory metal thin film | — | 1998-05-05 |