| 5856228 |
Manufacturing method for making bipolar device having double polysilicon structure |
Hiroyuki Miwa, Shigeru Kanematsu, Takayuki Gomi, Takashi Noguchi, Katsuyuki Kato +2 more |
1999-01-05 |
| 5665615 |
Method of making BiCMOS semiconductor device |
— |
1997-09-09 |
| 5643806 |
Manufacturing method for making bipolar device |
Hiroyuki Miwa, Shigeru Kanematsu, Takayuki Gomi, Takashi Noguchi, Katsuyuki Kato +2 more |
1997-07-01 |
| 5641692 |
Method for producing a Bi-MOS device |
Hiroyuki Miwa |
1997-06-24 |
| 5541124 |
Method for making bipolar transistor having double polysilicon structure |
Hiroyuki Miwa, Shigeru Kanematsu, Takayuki Gomi, Takashi Noguchi, Katsuyuki Kato +2 more |
1996-07-30 |
| 5324672 |
Manufacturing method for bipolar transistor |
Hiroyuki Miwa |
1994-06-28 |
| 5163178 |
Semiconductor device having enhanced impurity concentration profile |
Takayuki Gomi, Minoru Nakamura, Norikazu Chuchi, Hiroyuki Miwa, Akio Kayanuma +1 more |
1992-11-10 |
| 5101258 |
Semiconductor integrated circuit device of master slice approach |
Shigeru Moriuchi, Masashi Takeda, Takayuki Mogi |
1992-03-31 |
| 5055905 |
Semiconductor device |
— |
1991-10-08 |