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Isolation structure having a second impurity region with greater impurity doping concentration surrounds a first impurity region and method for forming the same, and image sensor including the isolation structure and method for fabricating the image sensor |
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Image sensor having 3D photoelectric conversion device |
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2015-12-01 |
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2015-11-17 |
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Image sensor and method for fabricating the same |
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Do Hwan Kim, Hyun-Chul Sohn, Hee Do Na, Kyung Dong Yoo |
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Methods of forming metal-insulator-metal (MIM) capacitors with passivation layers on dielectric layers |
Duk-Min Yi, Sang-Il Jung, Jong Wook Hong |
2011-09-13 |
| 7749852 |
Methods of forming metal-insulator-metal (MIM) capacitors with passivation layers on dielectric layers |
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2010-07-06 |
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CMOS image sensor |
Duk-Min Yi, Jin-hyeong Park |
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CMOS image sensor and method for forming the same |
— |
2009-02-10 |
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CMOS image sensor |
Duk-Min Yi, Jin-hyeong Park |
2008-05-27 |
| 6559475 |
Test pattern for evaluating a process of silicide film formation |
— |
2003-05-06 |
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Method of fabricating semiconductor device having a dual-gate |
Kang-Sik Youn, Hong-Bae Park |
2001-04-17 |
