Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11781244 | Seed crystal for single crystal 4H—SiC growth and method for processing the same | Masatake Nagaya, Hidetaka TAKABA | 2023-10-10 |
| 10793758 | Two-pack type urethane-based adhesive composition | Yuichi Matsuki, Megumi Abe, Hideyuki Matsuda, Masaki Yamamoto | 2020-10-06 |
| 10513644 | Two-pack curable urethane adhesive composition | Megumi Abe, Yuichi Matsuki | 2019-12-24 |
| 10453693 | Surface machining method for single crystal SiC substrate, manufacturing method thereof, and grinding plate for surface machining single crystal SiC substrate | Tomohisa Kato | 2019-10-22 |
| 9960048 | Surface machining method for single crystal SiC substrate, manufacturing method thereof, and grinding plate for surface machining single crystal SiC substrate | Tomohisa Kato | 2018-05-01 |
| 9617432 | Primer composition | Shigeru Yamauchi | 2017-04-11 |
| 9620374 | Surface machining method for single crystal SiC substrate, manufacturing method thereof, and grinding plate for surface machining single crystal SiC substrate | Tomohisa Kato | 2017-04-11 |
| 6844263 | LSI device polishing composition and method for producing LSI device | Yoshitomo Shimazu, Nobuo Uotani | 2005-01-18 |
| 6733553 | Abrasive composition for polishing semiconductor device and method for producing semiconductor device using the same | Fumio Tsujino | 2004-05-11 |
| 6547843 | LSI device polishing composition and method for producing LSI device | Yoshitomo Shimazu, Nobuo Uotani | 2003-04-15 |
| 6478836 | Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry | Masayuki Sanbayashi, Fumio Tsujino, Kagetaka Ichikawa | 2002-11-12 |
| 6436835 | Composition for polishing a semiconductor device and process for manufacturing a semiconductor device using the same | Kagetaka Ichikawa | 2002-08-20 |
| 6410444 | Composition for polishing a semiconductor device and process for manufacturing a semiconductor device using the same | Kagetaka Ichikawa | 2002-06-25 |
| 6387139 | Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry | Masayuki Sanbayashi, Fumio Tsujino, Kagetaka Ichikawa | 2002-05-14 |
| 6299659 | Polishing material composition and polishing method for polishing LSI devices | Fumio Tsujino, Kagetaka Ichikawa, Nobuo Uotani | 2001-10-09 |
| 5935278 | Abrasive composition for magnetic recording disc substrate | Ken Ishitobi, Hiromu Sakamoto | 1999-08-10 |
| 5800577 | Polishing composition for chemical mechanical polishing | — | 1998-09-01 |