NU

Nobuo Uotani

SE Seiko Epson: 7 patents #2,406 of 7,774Top 35%
SD Showa Denko: 4 patents #38 of 593Top 7%
SK Showa Denko K.K.: 4 patents #353 of 1,736Top 25%
Overall (All Time): #326,890 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7018455 Ink composition, recording medium, ink jet recording method, and printed matter Kazuhiko Kitamura, Yasuhiro Oki, Tetsuya Aoyama, Kyoichi Oka, Hiroshi Takahashi +1 more 2006-03-28
6989054 Ink jet white ink and titanium dioxide slurry therefor Seiichi Tanabe, Kiyohiko Takemoto, Seiji Mochizuki, Yasunori Yamazaki, Toshimasa Mori +3 more 2006-01-24
6952025 Semiconductor light-emitting device Takayuki Kamemura, Kazuhiro Mitani, Teruyuki Kobayashi, Kasumi Nakamura, Yuji Itoh 2005-10-04
6844263 LSI device polishing composition and method for producing LSI device Yoshitomo Shimazu, Takanori Kido 2005-01-18
6811597 Ink composition, recording medium, inkjet recording method, and recording Yasuhiro Oki, Kazuhiko Kitamura, Tetsuya Aoyama, Kyoichi Oka, Hiroshi Takahashi +1 more 2004-11-02
6761759 Ink composition, ink jet recording method and recorded matter Yasuhiro Oki, Kazuhiko Kitamura, Tetsuya Aoyama, Kyoichi Oka, Hiroshi Takahashi +1 more 2004-07-13
6676735 Aqueous ink Yasuhiro Oki, Kazuhiko Kitamura, Tetsuya Aoyama, Hiroshi Takahashi, Yuji Ito 2004-01-13
6547843 LSI device polishing composition and method for producing LSI device Yoshitomo Shimazu, Takanori Kido 2003-04-15
6498222 Water resistance imparter, ink composition, reactive fluid, and method of ink-jet recording with two fluids Kazuhiko Kitamura, Hitoshi Ota, Tetsuya Aoyama, Yuji Ito, Hiroshi Takahashi 2002-12-24
6362348 Additive for inkjet printing, recording solution, method for preventing discoloration and fading of image, and recording sheet Hiroshi Takahashi, Yuji Itoh, Toshio Koshikawa 2002-03-26
6337301 Photocatalytic metal oxide composition, thin film, and composite Masahiro Ohmori, Hidenori Nakamura, Noriko Murase, Takashi Ohkubo 2002-01-08
6299659 Polishing material composition and polishing method for polishing LSI devices Takanori Kido, Fumio Tsujino, Kagetaka Ichikawa 2001-10-09
5491203 Polyorganosiloxane and process for producing the same Fumio Matsui, Masatoshi Murakami, Yuji Itoh 1996-02-13
4954590 Preparation of polymer having isoindole structures Haruo Yoshida, Yoshihiro Saida 1990-09-04
4833231 Polymer having isoindole structure Haruo Yoshida, Yoshihiro Saida 1989-05-23