Issued Patents All Time
Showing 26–50 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7297473 | Method of forming a microlens array having a high fill factor | Bruce D. Ulrich | 2007-11-20 |
| 7259055 | Method of forming high-luminescence silicon electroluminescence device | Tingkai Li, Pooran Chandra Joshi, Wei Gao, Sheng Teng Hsu | 2007-08-21 |
| 7256426 | Rare earth element-doped silicon/silicon dioxide lattice structure | Tingkai Li, Wei Gao, Sheng Teng Hsu | 2007-08-14 |
| 7208768 | Electroluminescent device | Wei Gao, John F. Conley, Jr., Osamu Nishio, Keizo Sakiyama | 2007-04-24 |
| 7196383 | Thin film oxide interface | Pooran Chandra Joshi, John W. Hartzell, Masahiro Adachi | 2007-03-27 |
| 7190526 | Step-over lithography to produce parabolic photoresist profiles for microlens formation | Bruce D. Ulrich | 2007-03-13 |
| 7160819 | Method to perform selective atomic layer deposition of zinc oxide | John F. Conley, Jr., David R. Evans | 2007-01-09 |
| 7129552 | MOSFET structures with conductive niobium oxide gates | Wei Gao | 2006-10-31 |
| 7087526 | Method of fabricating a p-type CaO-doped SrCu2O2 thin film | Wei-Wei Zhuang, Wei Gao | 2006-08-08 |
| 7053009 | Nanolaminate film atomic layer deposition method | John F. Conley, Jr., Rajendra Solanki | 2006-05-30 |
| 7029944 | Methods of forming a microlens array over a substrate employing a CMP stop | John F. Conley, Jr., Wei Gao, David R. Evans | 2006-04-18 |
| 7015138 | Multi-layered barrier metal thin films for Cu interconnect by ALCVD | Wei Pan, David R. Evans, Sheng Teng Hsu | 2006-03-21 |
| 6998317 | Method of making a non-volatile memory using a plasma oxidized high-k charge-trapping layer | — | 2006-02-14 |
| 6930059 | Method for depositing a nanolaminate film by atomic layer deposition | John F. Conley, Jr., Rajendra Solanki | 2005-08-16 |
| 6902960 | Oxide interface and a method for fabricating oxide thin films | Pooran Chandra Joshi, John W. Hartzell, Masahiro Adachi | 2005-06-07 |
| 6875677 | Method to control the interfacial layer for deposition of high dielectric constant films | John F. Conley, Jr. | 2005-04-05 |
| 6873048 | System and method for integrating multiple metal gates for CMOS applications | Wei Gao, John F. Conley, Jr. | 2005-03-29 |
| 6861712 | MOSFET threshold voltage tuning with metal gate stack control | Wei Gao | 2005-03-01 |
| 6858514 | Low power flash memory cell and method | Sheng Teng Hsu | 2005-02-22 |
| 6833572 | Electrode materials with improved hydrogen degradation resistance | Fengyan Zhang, Tingkai Li, Hong Ying, Sheng Teng Hsu | 2004-12-21 |
| 6825106 | Method of depositing a conductive niobium monoxide film for MOSFET gates | Wei Gao | 2004-11-30 |
| 6780700 | Method of fabricating deep sub-micron CMOS source/drain with MDD and selective CVD silicide | Katsuji Iguchi, Sheng Teng Hsu, Jer-Shen Maa | 2004-08-24 |
| 6737693 | Ferroelastic integrated circuit device | Tingkai Li, Fengyan Zhang, Sheng Teng Hsu | 2004-05-18 |
| 6720258 | Method of fabricating a nickel silicide on a substrate | Jer-Shen Maa, Douglas J. Tweet, Fengyan Zhang, Sheng Teng Hsu | 2004-04-13 |
| 6689646 | Plasma method for fabricating oxide thin films | Pooran Chandra Joshi, John W. Hartzell, Masahiro Adachi | 2004-02-10 |