Issued Patents All Time
Showing 26–43 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7723913 | Graded junction silicon nanocrystal embedded silicon oxide electroluminescence device | Vincenzo Casasanta, III, Apostolos T. Voutsas | 2010-05-25 |
| 7723242 | Enhanced thin-film oxidation process | Apostolos T. Voutsas, John W. Hartzell | 2010-05-25 |
| 7544625 | Silicon oxide thin-films with embedded nanocrystalline silicon | Tingkai Li, Yoshi Ono, Apostolos T. Voutsas, John W. Hartzell | 2009-06-09 |
| 7446023 | High-density plasma hydrogenation | Apostolos T. Voutsas, John W. Hartzell | 2008-11-04 |
| 7439187 | Grayscale reticle for precise control of photoresist exposure | Yoshi Ono, Bruce D. Ulrich | 2008-10-21 |
| 7381595 | High-density plasma oxidation for enhanced gate oxide performance | Apostolos T. Voutsas, John W. Hartzell | 2008-06-03 |
| 7259055 | Method of forming high-luminescence silicon electroluminescence device | Tingkai Li, Wei Gao, Yoshi Ono, Sheng Teng Hsu | 2007-08-21 |
| 7196383 | Thin film oxide interface | John W. Hartzell, Masahiro Adachi, Yoshi Ono | 2007-03-27 |
| 7186663 | High density plasma process for silicon thin films | Apostolos T. Voutsas, John W. Hartzell | 2007-03-06 |
| 7163882 | Formulation and fabrication of an improved Ni based composite Ohmic contact to n-SiC for high temperature and high power device applications | Melanie W. Cole | 2007-01-16 |
| 7122487 | Method for forming an oxide with improved oxygen bonding | — | 2006-10-17 |
| 7122488 | High density plasma process for the formation of silicon dioxide on silicon carbide substrates | Apostolos T. Voutsas, John W. Hartzell | 2006-10-17 |
| 7087537 | Method for fabricating oxide thin films | Apostolos T. Voutsas | 2006-08-08 |
| 6919283 | Fabrication of pure and modified Ta2O5 thin film with enhanced properties for microwave communication, dynamic random access memory and integrated electronic applications | — | 2005-07-19 |
| 6902960 | Oxide interface and a method for fabricating oxide thin films | John W. Hartzell, Masahiro Adachi, Yoshi Ono | 2005-06-07 |
| 6759683 | Formulation and fabrication of an improved Ni based composite Ohmic contact to n-SiC for high temperature and high power device applications | Melanie W. Cole | 2004-07-06 |
| 6689646 | Plasma method for fabricating oxide thin films | John W. Hartzell, Masahiro Adachi, Yoshi Ono | 2004-02-10 |
| 6071555 | Ferroelectric thin film composites made by metalorganic decomposition | Somnath Sengupta, Steven Stowell, Louise Sengupta, Sasangan Ramanathan, Seshu B. Desu | 2000-06-06 |