Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8136479 | Plasma treatment apparatus and plasma treatment method | Hideo Sugai, Tetsuya Ide, Atsushi Sasaki, Kazufumi Azuma | 2012-03-20 |
| 7728251 | Plasma processing apparatus with dielectric plates and fixing member wavelength dependent spacing | Tetsuya Ide, Atsushi Sasaki, Kazufumi Azuma | 2010-06-01 |
| 7446060 | Thin-film forming method using silane and an oxidizing gas | Masashi Goto, Kazufumi Azuma | 2008-11-04 |
| 7311796 | Plasma processing apparatus | Masashi Goto, Kazufumi Azuma, Tetsuya Okamoto | 2007-12-25 |
| 7307028 | Film-forming method, method of manufacturing semiconductor device, semiconductor device, method of manufacturing display device, and display device | Masashi Goto, Kazufumi Azuma | 2007-12-11 |
| 6900083 | Method of forming multi-layers for a thin film transistor | Apostolos T. Voutsas | 2005-05-31 |
| 6830965 | Semiconductor device and a method of creating the same utilizing metal induced crystallization while suppressing partial solid phase crystallization | Apostolos T. Voutsas, Takeshi Hosoda | 2004-12-14 |
| 6789499 | Apparatus to sputter silicon films | Apostolos T. Voutsas | 2004-09-14 |
| 6784455 | Single crystal TFT from continuous transition metal delivery method | Masashi Maekawa | 2004-08-31 |
| 6717178 | Semiconductor devices fabricated using sputtered silicon targets | Apostolos T. Voutsas, John W. Hartzell | 2004-04-06 |
| 6620661 | Single crystal TFT from continuous transition metal delivery method | Masashi Maekawa | 2003-09-16 |
| 6620744 | Insulating film formation method, semiconductor device, and production apparatus | Takashi Itoga, Tetsuya Okamoto, Toshimasa Hamada | 2003-09-16 |
| 6590228 | LCD device with optimized channel characteristics | Apostolos T. Voutsas, John W. Hartzell | 2003-07-08 |
| 6579425 | System and method for forming base coat and thin film layers by sequential sputter depositing | Apostolos T. Voutsas | 2003-06-17 |
| 6573163 | Method of optimizing channel characteristics using multiple masks to form laterally crystallized ELA poly-Si films | Apostolos T. Voutsas, John W. Hartzell | 2003-06-03 |
| 6495405 | Method of optimizing channel characteristics using laterally-crystallized ELA poly-Si films | Apostolos T. Voutsas, John W. Hartzell | 2002-12-17 |
| 6432804 | Sputtered silicon target for fabrication of polysilicon thin film transistors | Apostolos T. Voutsas, John W. Hartzell | 2002-08-13 |
| 6429097 | Method to sputter silicon films | Apostolos T. Voutsas | 2002-08-06 |
| 6396104 | Thin film transistor in metal-induced crystallized region formed around a transition metal nucleus site | Masashi Maekawa | 2002-05-28 |
| 6346437 | Single crystal TFT from continuous transition metal delivery method | Masashi Maekawa | 2002-02-12 |
| 6271062 | Thin film semiconductor device including a semiconductor film with high field-effect mobility | Masaki Fujihara, Masahiro Date, Takuya Matsuo, Michiteru Ayukawa, Takashi Itoga | 2001-08-07 |
| 6228693 | Selected site, metal-induced, continuous crystallization method | Masashi Maekawa | 2001-05-08 |
| 6078059 | Fabrication of a thin film transistor and production of a liquid display apparatus | — | 2000-06-20 |
| 5796116 | Thin-film semiconductor device including a semiconductor film with high field-effect mobility | Masaki Fujihara, Masahiro Date, Takuya Matsuo, Michiteru Ayukawa, Takashi Itoga | 1998-08-18 |
| 5686349 | Fabrication of a thin film transistor and production of a liquid crystal display apparatus | — | 1997-11-11 |