JK

Juri Kato

SE Seiko Epson: 35 patents #379 of 7,774Top 5%
SE Sieko Epson: 1 patents #1 of 26Top 4%
TT Tokyo Institute Of Technology: 1 patents #411 of 1,159Top 40%
Overall (All Time): #94,583 of 4,157,543Top 3%
36
Patents All Time

Issued Patents All Time

Showing 26–36 of 36 patents

Patent #TitleCo-InventorsDate
6156592 Method of manufacturing a semiconductor device containing CMOS elements Kazuo Tanaka 2000-12-05
5879979 Method of manufacturing a semiconductor device containing CMOS elements Kazuo Tanaka 1999-03-09
5654209 Method of making N-type semiconductor region by implantation 1997-08-05
5641983 Semiconductor device having a gate electrode having a low dopant concentration Kazuo Tanaka 1997-06-24
5312772 Method of manufacturing interconnect metallization comprising metal nitride and silicide Kenji Yokoyama, Masashi Ogita 1994-05-17
5298860 Method of analyzing metal impurities in surface oxide film of semiconductor substrate 1994-03-29
5229334 Method of forming a gate insulating film involving a step of cleaning using an ammonia-peroxide solution 1993-07-20
4998157 Ohmic contact to silicon substrate Kenji Yokoyama, Masashi Ogita 1991-03-05
4833098 Polycrystalline semiconductor deposition in groove for device insolation 1989-05-23
4800417 Improved semiconductor device having a polycrystalline isolation region 1989-01-24
4669176 Method for diffusing a semiconductor substrate through a metal silicide layer by rapid heating 1987-06-02