Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6808564 | In-situ post epitaxial treatment process | — | 2004-10-26 |
| 6632277 | Optimized silicon wafer gettering for advanced semiconductor devices | Sean G. Hanna, Zbigniew J. Radzimski | 2003-10-14 |
| 6565651 | Optimized silicon wafer strength for advanced semiconductor devices | Sean G. Hanna, Zbigniew J. Radzimski | 2003-05-20 |
| 6562128 | In-situ post epitaxial treatment process | Oleg Kononchuk | 2003-05-13 |
| 6506667 | Growth of epitaxial semiconductor material with improved crystallographic properties | Mark R. Boydston, Oleg Kononchuk | 2003-01-14 |
| 6471771 | In-situ post epitaxial treatment process | — | 2002-10-29 |
| 6454852 | High efficiency silicon wafer optimized for advanced semiconductor devices | Sean G. Hanna, Zbigniew J. Radzimski | 2002-09-24 |
| 6395085 | Purity silicon wafer for use in advanced semiconductor devices | Sean G. Hanna, Zbigniew J. Radzimski | 2002-05-28 |
| 6375749 | Susceptorless semiconductor wafer support and reactor system for epitaxial layer growth | Mark R. Boydston, Dominic A. Hartmann | 2002-04-23 |
| 6338756 | In-situ post epitaxial treatment process | — | 2002-01-15 |
| 6284986 | Method of determining the thickness of a layer on a silicon substrate | Oleg Kononchuk | 2001-09-04 |
| 6190453 | Growth of epitaxial semiconductor material with improved crystallographic properties | Mark R. Boydston, Oleg Kononchuk | 2001-02-20 |
| 6184154 | Method of processing the backside of a wafer within an epitaxial reactor chamber | Oleg Kononchuk | 2001-02-06 |
| 6013319 | Method and apparatus for increasing deposition quality of a chemical vapor deposition system | — | 2000-01-11 |
| 5964948 | Exhaust insert for barrel-type epitaxial reactors | Dena Carol Anderson Mitchell | 1999-10-12 |
| 5685906 | Method and apparatus for configuring an epitaxial reactor for reduced set-up time and improved layer quality | Erik D. Holman | 1997-11-11 |