Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9606452 | Lithography metrology method for determining best focus and best dose and lithography monitoring method using the same | Byung Je Jung, Byoung Il Choi | 2017-03-28 |
| 9570364 | Method of detecting focus shift in lithography process, method of analyzing error of transferred pattern using the same and method of manufacturing semiconductor device using the methods | Suk-Joo Lee, Byoung Il Choi | 2017-02-14 |
| 8045787 | System for analyzing mask topography and method of forming image using the system | Soo Han Choi, Moon-Hyun Yoo, Joon-Ho Choi, Ji Suk Hong | 2011-10-25 |
| 7940373 | Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same | Sung-soo Suh, Suk-Joo Lee, Han-ku Cho, Sung Woo Lee, Young-Chang Kim | 2011-05-10 |