Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9171755 | Methods of manufacturing semiconductor devices including capped metal patterns with air gaps in-between for parasitic capacitance reduction | Euibok Lee, Jongmin Baek, Dohyoung Kim, Tsukasa Matsuda, YoungWoo Cho | 2015-10-27 |